• English
  • 简体中文
  • 繁體中文
  • Tiếng Việt
  • ไทย
  • Indonesia
Subscribe
Real-time News
September 9th - According to the Seoul Economic Daily, Samsung Electronics will collaborate with ASML, the worlds largest lithography equipment manufacturer, to develop high numerical aperture (High-NA) extreme ultraviolet (EUV) lithography technology. Samsung is participating in a project aimed at driving an industry standard shift, moving from 6-inch photomasks, used since the 1980s, to 12-inch versions, and striving to be the first to establish a mass production system for DRAM based on High-NA EUV equipment. Samsung plans to begin using High-NA EUV equipment in DRAM production starting in 2028, and subsequently extend this technology to 1.4-nanometer advanced logic processes to drive its foundry business. Increasing the photomask size aims to overcome the limitations of EUV technology. High-NA EUV has a numerical aperture 66% higher than traditional EUV, enabling the formation of finer circuit patterns. Replacing the currently used 6-inch photomasks with 12-inch photomasks can improve foundry efficiency and reduce chip manufacturing costs.The Iranian Revolutionary Guard Corps used powerful ballistic missiles to strike the US destroyers DDG-119 and DDG-53, which are equipped with cruise missiles and the Aegis Combat System. The attack caused serious damage to the ships.Samsung Electronics: Announces strategic partnership with MistralAI to jointly build a smart-driven semiconductor infrastructure.September 9th - Recently, the Israeli army has intensified its crackdown on Palestinians in the West Bank, forcibly demolishing houses and causing large-scale damage to local Palestinian villages, displacing people. A recent Israeli military raid even completely wiped out a Palestinian village.Japans Reuters Tankan Manufacturing Sentiment Index for September was 21, down from 18 in the previous month.

S&P500 Update: The Correction Became Increasingly More Complex. Where Could It End?

Skylar Shaw

May 25, 2022 10:06

微信截图_20220525095500.png


Elliot Wave Analysis of the S&P 500

Until last week, the continuous correction in the S&P 500 (SPX) that I'd been following using the Elliott Wave Principle (EWP) had followed a conventional Fibonacci-based impulse pattern quite well (SF-BIP). For more than a month, just a few modifications were required. Thus, by last week, the index had done enough to the negative (see here) for the correction to be considered complete, as it had completed five waves down from the March 29 rebound high.


However, it chose to give us another "curveball" by dropping below the previous week's low. This dip adds to the continuing price action's intricacy and provides more evidence that the current price action is corrective since the all-time high (ATH). "I will have to adjust my present POV on a dip below last week's low," I said last week, and I will do so in this update.

S&P 500 Forecast and Bottom Line

Last week, the S&P500 had all the components to "either... rebound to preferably SPX4340+/-20 from whence I predict a last c-wave down to end the correction at SPX3750+/-25." Alternatively, the correction is ended and the index is on its way to about SPX4325+/-25. Before the wave-ii to new ATHs begins, I estimate a wave-ii fall to about SPX4100+/-75. On a decline below last week's low, I'll have to rethink my present outlook." As a result of last Friday's dip, I had to adjust my outlook, and the index is currently at a fork in the road:


Hold around today's lows for a rise above yesterday's high to SPX4160, then drop to 4050 and rally to 4225 for a more substantial impulsive route. Alternatively, we may drop below last Friday's low, preferably SPX3732-3762, before looking for another probable upward impulse.